| Shutter mechanism devides panel into separate exposure sections |
|
To minimize the scaling error of expansion and shrinkage of the panel and / or photomask, the shutter blocks the light to areas other than the exposure area. The number of sections a panel can be divided into is user-defined as 2 / 3 / 4 / 6. Alignment is made prior to each section being exposed. The number of sections to be exposed separately depends on the accuracy required by the panel. Conventional global exposure is also available.
Partial exposure ( Shutter blade mechanism ) |
| Applicable to thin panels |
|
Transportation hands with vacuum pads are used enabling high-speed and stable panel transportation of ultra thin substrate down to 0.025mm thin (core thickness). Also, non-contact vacuum pads are added in the model for solder resist to keep panels flat during panel transportation with minimizing the contact zone at the panel edges. |
| Automatic platen / mask cleaning |
|
Automatic Mask and Platen Cleaning by clean rollers and dust collection nozzles minimize contamination of dust brought in by panels. The frequency of the automatic cleaning cycle is user defined. This mechanism reduces frequency of manual cleaning by operators as well as reducing door opening of exposure chamber. |
| Consumables replacement & Maintenance timing control |
|
The system raises alarm to operators for maintenance and consumable parts replacement, once those frequencies are set initially. |
| U-contact method |
|
ADTEC Engineering proprietary U-contact method realizes even, stable and high speed contact between panel and photomask while eliminating the need of spacers.
High Resolution (HR) mode is optionally available that achieves even higher resolution by limiting the panel size. |
| Remote suppot service |
|
Realtime support can be optionally provided with remote monitoring of touch screen and image processing screen by having an Internet connection where ADTEC Engineering's exposure systems are installed at the customer's site to connect to ADTEC Engineering's Support Center. |
| MLS (Multi Lamp System) |
|
The newly developed lamp system (UV light source) is now available for solder resist imaging exposure systems.
MLS obtains approx. 1.5 times more energy efficient compared to conventional 5kW collimated light source resulting in shorter exposure time. More over, providing a simple lamp replacement procedure and achieving 2000hrs of long lamp life will realize significant reduction in running cost. |
 |
